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dc.contributor.authorKolenatý, D.
dc.contributor.authorVlček, J.
dc.contributor.authorHouška, J.
dc.contributor.authorKozák, T.
dc.contributor.editorRendl, Jan
dc.date.accessioned2018-07-03T11:38:25Z-
dc.date.available2018-07-03T11:38:25Z-
dc.date.issued2018
dc.identifier.citationRENDL, Jan ed. Studentská vědecká konference: magisterské a doktorské studijní programy, sborník rozšířených abstraktů, květen 2018, Plzeň. Plzeň: Západočeská univerzita v Plzni, 2019, s. 17-18. ISBN 978-80-261-0790-3.cs
dc.identifier.isbn978-80-261-0790-3
dc.identifier.urihttp://hdl.handle.net/11025/29805
dc.identifier.urihttp://svk.fav.zcu.cz/download/sbornik_svk_2018.pdf
dc.description.sponsorshipStudentská vědecká konference je pořádána s podporou prostředků na specifický vysokoškolský výzkum SVK1-2018-024.cs
dc.format2 s.cs
dc.format.mimetypeapplication/pdf
dc.language.isoenen
dc.publisherZápadočeská univerzita v Plznics
dc.rights© Západočeská univerzita v Plznics
dc.subjecttenké vrstvycs
dc.subjectdepozicecs
dc.subjectaplikace chytrých okencs
dc.titleControlled reactive HiPIMS – effective technique for lowtemperature deposition of VO2-based multilayer coatings for smart window applicationsen
dc.typekonferenční příspěvekcs
dc.typeconferenceObjecten
dc.rights.accessopenAccessen
dc.type.versionpublishedVersionen
dc.description.abstract-translatedVanadium dioxide (VO2) is a technologically important thin film material of a high current world wide interest due to its reversible first-order thermochromic transition relatively near room temperature (approximately 68°C). Magnetron sputtering is probably the most important preparation technique of VO2 films, and numerous deposition pathways have been reported in recent years. The research in this area is focused on (at least) the following three challenges. First, doping of VO2 by other metals in order to decrease the transition temperature (Ttr) from 68 °C (bulk materials) or e.g. 50 °C (thin films) to the room temperature. Second, decreasing the deposition temperature (Tdep) of crystalline VO2 at least below 300 °C, ideally without any substrate bias and without any crystalline interlayer, in order (i) to facilitate the large-scale production by reducing the energy consumption and minimizing problems with temperature uniformity over large substrate surfaces, (ii) to limit the diffusion of harmful elements from substrates such as soda-lime glass and (iii) to allow deposition on temperaturesensitive plastic substrates. Third, improving the luminous transmittance (Tlum) and the modulation of the solar transmittance (Tsol) of the coatings by antireflection (AR) layers. (J. Houška et al. (2017))en
dc.subject.translatedthin filmsen
dc.subject.translateddepositionen
dc.subject.translatedsmart window applicationsen
dc.type.statusPeer-revieweden
Appears in Collections:Studentská vědecká konference 2018-magisterské a doktorské studijní programy
Studentská vědecká konference 2018-magisterské a doktorské studijní programy

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