Název:	Thermal behaviour of magnetron sputtered tungsten and tungsten-boride thin films
Autoři:	Avotina, Liga Bumbure, Lada Goldmane, Annija Elizabete Vanags, Edgars Romanova, Marina Sorokins, Hermanis Zaslavskis, Aleksandrs Kizane, Gunta Dekhtyar, Yuri
Citace zdrojového dokumentu:	2022 International Conference on Applied Electronics: Pilsen, 6th – 7th September 2022, Czech Republic, p. 29-32.
Datum vydání:	2022
Nakladatel:	Fakulta elektrotechnická ZČU
Typ dokumentu:	konferenční příspěvek conferenceObject
URI:	http://hdl.handle.net/11025/49845
ISBN:	978-1-6654-9482-3
Klíčová slova:	wolfram;borid wolframu;nanofilmy;tepelné zpracování;tepelně stimulovaná emise exoelektronů
Klíčová slova v dalším jazyce:	tungsten;tungsten diboride;nanofilms;thermal treatment;thermally stimulated exoelectron emission
Abstrakt v dalším jazyce:	Magnetron sputtered tungsten and tungsten diboride nanofilms are proposed to be used in microelectronic devices. Methods of deposition for nanofilms on oxidized silicon followed by etching is among the techniques to be applied for production. However, physical-chemical interactions between various films need to be taken into account. Therefore, a complete surface and in-depth characterization of synthesized films is necessary. Tungsten and tungsten diboride nanofilms are deposited by magnetron sputtering technique, followed by plasma chemical and chemical etching. Characterization of the structures is separated in several main steps including surface morphology, analysis of element composition as well as characterization of thermal properties, including estimation of presence of thermally active emission centers and thermally induced chemical conversions.
Práva:	© IEEE
Vyskytuje se v kolekcích:	Applied Electronics 2022 Applied Electronics 2022

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